发明名称 PHOTOMASK AND METHOD OF MANUFACTURING PHOTOMASK
摘要 The present invention relates to a photomask production method which comprises the following steps: supplying a flexible substrate; forming a plurality of microstructures on the flexible substrate; coating a shading material on the flexible substrate so that the flexible substrate can form a shading layer; and hardening the shading layer which is a single layer.
申请公布号 KR20160002349(A) 申请公布日期 2016.01.07
申请号 KR20150082556 申请日期 2015.06.11
申请人 NATIONAL CHENG KUNG UNIVERSITY 发明人 YUNG CHUN LEE;CHUN YING WU;HENG HSIEH;YI TA HSIEH;JHIH NAN YAN
分类号 G03F7/20;G03F1/46;G03F1/48;G03F1/66;H01L21/033 主分类号 G03F7/20
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