发明名称 |
PHOTOMASK AND METHOD OF MANUFACTURING PHOTOMASK |
摘要 |
The present invention relates to a photomask production method which comprises the following steps: supplying a flexible substrate; forming a plurality of microstructures on the flexible substrate; coating a shading material on the flexible substrate so that the flexible substrate can form a shading layer; and hardening the shading layer which is a single layer. |
申请公布号 |
KR20160002349(A) |
申请公布日期 |
2016.01.07 |
申请号 |
KR20150082556 |
申请日期 |
2015.06.11 |
申请人 |
NATIONAL CHENG KUNG UNIVERSITY |
发明人 |
YUNG CHUN LEE;CHUN YING WU;HENG HSIEH;YI TA HSIEH;JHIH NAN YAN |
分类号 |
G03F7/20;G03F1/46;G03F1/48;G03F1/66;H01L21/033 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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