发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device capable of suppressing a variation accompanying mounting and a manufacturing method of the same.SOLUTION: The semiconductor device includes: a substrate 101; a conductive film 103 on the substrate 101. On the substrate 101, a via hole 111 that penetrates from a front surface to a rear surface and is closed by the conductive film 103 is formed. Between the substrate 101 and the conductive film 103, a hole 120 that connects a space inside the via hole 111 and a space above the front surface is formed.
申请公布号 JP2016001686(A) 申请公布日期 2016.01.07
申请号 JP20140121439 申请日期 2014.06.12
申请人 FUJITSU LTD 发明人 NIIDA YOSHITAKA
分类号 H01L21/3205;H01L21/768;H01L23/12;H01L23/522 主分类号 H01L21/3205
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