| 摘要 |
The present invention relates to an aligner capable of tilting a substrate, which comprises: a rotation unit installed on the ceiling of a chamber; a support plate formed as the rotation unit penetrates the same; a substrate holder on which a substrate is mounted; a substrate holder movement unit installed on the support plate to vertically move the substrate holder, and rotated by the rotation unit; a mask holder on which a mask is mounted; and a slop forming unit formed at an edge of a lower end of the support holder, and formed on an upper end of the mask holder so as to allow the mask holder to be slantly installed. According to the present invention, the mask is slantly seated on the mask holder, and a deposition material can be deposited while rotating the mask and the substrate while the substrate placed on the mask is also inclined, thereby performing the deposition even on a curve or a hole formed on a substrate pattern. In addition, a shadow, generated when the thick mask is used in a process of depositing the deposition material, can be reduced, and the shadow, generated when the intervals of the deposition pattern are narrow, can be also reduced. |
