发明名称 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING PROGRAM
摘要 PROBLEM TO BE SOLVED: To facilitate setting, change and management of a process recipe.SOLUTION: In a substrate processing apparatus including a control section for processing a substrate according to a processing procedure set in a process recipe, the process recipe links the processing procedure to a plurality of partial recipes unitized for each function, and the control section processes the substrate according to a processing procedure set in the plurality of partial recipes thus linked.
申请公布号 JP2016001726(A) 申请公布日期 2016.01.07
申请号 JP20150087044 申请日期 2015.04.21
申请人 TOKYO ELECTRON LTD 发明人 SASAKI MITSURU;MIURA TATSUYA;ONO TOSHIHIRO;ONO KAZUMUNE;ENDO SHOKO;KITAHARA RYU
分类号 H01L21/02;H01L21/3065 主分类号 H01L21/02
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