| 摘要 |
This X-ray fluorescence analysis device is provided with the following: an X-ray source (3) that exposes a sample (1), said sample (1) consisting of a large number of nanoparticles placed on top of a substrate (10), to primary X-rays (6); an exposure-angle adjustment means (5) that adjusts the exposure angle (α) at which the surface (10a) of the substrate is exposed to the primary X-rays (6); a detection means (8) that measures the intensity of X-ray fluorescence (7) produced by the sample (1); a peak-position computation means (11) that creates a sample profile indicating how the intensity of the X-ray fluorescence (7) varies as the exposure angle (α) varies and computes a peak exposure-angle position; a particle-size calibration-curve creation means (21) that creates a calibration curve representing the correlation between the peak exposure-angle position and the size of the nanoparticles (1); and a particle-size computation means (22) that computes the size of nanoparticles in an unknown sample (1) by plugging in the peak exposure-angle position of said unknown sample (1) to the calibration curve. |
