发明名称 NANOFABRICATION OF NANOPOROUS ARRAYS
摘要 An array having nanopores is produced by coating a thin layer of metal or other material onto a substrate and creating a mask on the metal or other material by combining a first polymer and a second polymer. The first polymer self-assembles into nanodomains of the first polymer in the second polymer resulting in the formation of a uniform hexagonal pattern of the first polymer nanodomains in the second polymer over the entire surface of the metal or other material. The nanodomains are removed by etching to form nano-voids that extend through the polymer layer. Nanopores are created in the metal or other material layer by ion beam milling the metal through the nano-voids to produce nano-pores that extend through the metal or other material creating an array having nanopores.
申请公布号 US2016001232(A1) 申请公布日期 2016.01.07
申请号 US201514755403 申请日期 2015.06.30
申请人 LAWRENCE LIVERMORE NATIONAL SECURITY, LLC ;ETH ZURICH 发明人 Bond Tiziana C.;Park Hyung Gyu;Altun Ali O.
分类号 B01D67/00;H01M4/02;H01M4/04 主分类号 B01D67/00
代理机构 代理人
主权项 1. A nanolithography method for creating an array, comprising the steps of: providing a substrate having surface; coating a layer of material on said surface of said substrate providing a material surface; forming a mask on said material surface by combining a first polymer and a second polymer to form self-assembled nanodomains of said first polymer in said second polymer and removing said nanodomains to form nano-voids in said mask; and ion beam milling said material through said nano-voids in said mask producing nano-pores in said material creating the array.
地址 Livermore CA US