发明名称 CYANOGEN-BASED ELECTROLYTIC GOLD PLATING BATH AND BUMP FORMATION METHOD USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a cyanogen-based electrolytic gold plating bath which forms a gold bump of a film hardness of 70-120 HV.SOLUTION: A cyanogen-based electrolytic gold plating bath for bump formation is prepared by adding a gold cyanide salt as, a gold source, to a gold concentration of 0.1-15 g/L, an oxalate to a concentration, converted to oxalic acid, of 2.5-50 g/L, an inorganic acid conductive salt to a concentration of 5-100 g/L, a water-soluble polysaccharide to a concentration of 0.1-50 g/L and a crystal adjustment agent to a concentration, converted to the metal concentration, of 1-100 mg/L. The water-soluble polysaccharide is preferably dextrin, α-cyclodextrin, &bgr;-cyclodextrin or dextran.
申请公布号 JP2016000839(A) 申请公布日期 2016.01.07
申请号 JP20140120323 申请日期 2014.06.11
申请人 METALOR TECHNOLOGIES JAPAN CO LTD 发明人 FURUKAWA MASATO
分类号 C25D3/48;C25D5/50;C25D7/12;H01L21/60 主分类号 C25D3/48
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