发明名称 |
HIGH HEAT-RESISTANT POLYAMIC ACID SOLUTION AND POLYIMIDE FILM |
摘要 |
The present invention relates to a high heat-resistant polyamic acid solution and a polyimide film, and can provide a polyimide film which has improved heat dimensional stability by comprising a polyamic acid solution containing a polymer of a diamine compound and a dianhydride, the polymer containing a diamine compound having a carboxyl functional group in 1mol% to 10mol% on the basis of the total content of diamines; and, as an imide thereof, a polyimide in which main chains are cross-linked therebetween via an amide linkage. |
申请公布号 |
WO2016003146(A1) |
申请公布日期 |
2016.01.07 |
申请号 |
WO2015KR06666 |
申请日期 |
2015.06.30 |
申请人 |
KOLON INDUSTRIES, INC. |
发明人 |
MIN, WOONG KI;PARK, HYO JUN;JUNG, HAK GEE;HONG, KI IL |
分类号 |
C08G73/10;C08J5/18;C08L79/08 |
主分类号 |
C08G73/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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