发明名称 HIGH HEAT-RESISTANT POLYAMIC ACID SOLUTION AND POLYIMIDE FILM
摘要 The present invention relates to a high heat-resistant polyamic acid solution and a polyimide film, and can provide a polyimide film which has improved heat dimensional stability by comprising a polyamic acid solution containing a polymer of a diamine compound and a dianhydride, the polymer containing a diamine compound having a carboxyl functional group in 1mol% to 10mol% on the basis of the total content of diamines; and, as an imide thereof, a polyimide in which main chains are cross-linked therebetween via an amide linkage.
申请公布号 WO2016003146(A1) 申请公布日期 2016.01.07
申请号 WO2015KR06666 申请日期 2015.06.30
申请人 KOLON INDUSTRIES, INC. 发明人 MIN, WOONG KI;PARK, HYO JUN;JUNG, HAK GEE;HONG, KI IL
分类号 C08G73/10;C08J5/18;C08L79/08 主分类号 C08G73/10
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