| 摘要 |
The present invention relates to an etchant not using fluoride, an etching method using the same and an electronic device. The etchant of the present invention has excellent etching uniformity, and does not have problems of short-circuit and wiring fault without generating residue, and can etch a source line and a drain line in a lump, and can perform etching many times. Thus, it is possible to achieve simplification and efficiency of an etching process, and particularly, it is possible to reuse a glass substrate without etching the glass substrate by not including the fluoride. The present invention has excellent etching effects not causing IGZO damage and thus can be used in the etching process and a process of manufacturing the electronic device effectively. |
