| 发明名称 |
IMPEDANCE-BASED ADJUSTMENT OF POWER AND FREQUENCY |
| 摘要 |
Systems and methods for impedance-based adjustment of power and frequency are described. A system includes a plasma chamber for containing plasma. The plasma chamber includes an electrode. The system includes a driver and amplifier coupled to the plasma chamber for providing a radio frequency (RF) signal to the electrode. The driver and amplifier is coupled to the plasma chamber via a transmission line. The system further includes a selector coupled to the driver and amplifier, a first auto frequency control (AFC) coupled to the selector, and a second AFC coupled to the selector. The selector is configured to select the first AFC or the second AFC based on values of current and voltage sensed on the transmission line. |
| 申请公布号 |
US2016005573(A1) |
申请公布日期 |
2016.01.07 |
| 申请号 |
US201514850851 |
申请日期 |
2015.09.10 |
| 申请人 |
Lam Research Corporation |
发明人 |
Valcore, JR. John C.;Lyndaker Bradford J. |
| 分类号 |
H01J37/32 |
主分类号 |
H01J37/32 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A system comprising:
a plasma chamber for containing plasma, the plasma chamber including an electrode; a driver and amplifier coupled to the plasma chamber for providing a radio frequency (RF) signal to the electrode, the driver and amplifier coupled to the plasma chamber via a transmission line; a selector coupled to the driver and amplifier; a first auto frequency control (AFC) coupled to the selector; a second AFC coupled to the selector, wherein the selector is configured to select the first AFC or the second AFC based on values of current and voltage sensed on the transmission line. |
| 地址 |
Fremont CA US |
