| 发明名称 |
ACID GENERATORS AND PHOTORESISTS COMPRISING SAME |
| 摘要 |
Acid generator compounds are provided that are particularly useful as photoresist composition components. Preferred acid generators include cyclic sulfonium compounds that comprise a covalently linked acid-labile group. |
| 申请公布号 |
US2016002199(A1) |
申请公布日期 |
2016.01.07 |
| 申请号 |
US201514611768 |
申请日期 |
2015.02.02 |
| 申请人 |
Rohm and Haas Electronic Materials, LLC |
发明人 |
Cameron James F.;Jain Vipul;Labeaume Paul J.;Sung Jin Wuk;Thackeray James W. |
| 分类号 |
C07D333/76;C07C309/17;G03F7/20;G03F7/32;G03F7/004;G03F7/16 |
主分类号 |
C07D333/76 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A photoresist composition comprising:
(a) a polymer; and (b) an acid generator that comprises a cation component selected from the group consisting of: (i) 5-(4-(2-(1-ethylcyclopentyloxy)-2-oxoethoxy)-3,5-dimethylphenyl)-5H-dibenzo[b,d]thiophenium; and (ii) 5-(3,5-dimethyl-4-(2-oxo-2-(2-phenylpropan-2-yloxy)ethoxy)phenyl)-5H-dibenzo[b,d]thiophenium. |
| 地址 |
Marlborough MA US |
