发明名称 |
METHOD FOR MANUFACTURING REFLECTIVE MASK BLANK, AND METHOD FOR MANUFACTURING REFLECTIVE MASK |
摘要 |
A method of manufacturing a reflective mask blank comprising a multilayer reflective film formed on a substrate so as to reflect EUV light; and a laminated film formed on the multilayer reflective film. The method includes the steps of depositing the multilayer reflective film on the substrate to form a multilayer reflective film formed substrate; carrying out defect inspection for the multilayer reflective film formed substrate; depositing the laminated film on the multilayer reflective film of the multilayer reflective film formed substrate; forming a fiducial mark for an upper portion of the laminated film to thereby form a reflective mask blank comprising the fiducial mark, the fiducial mark serving as a reference for a defect position in defect information; and carrying out defect inspection of the reflective mask blank by using the fiducial mark as a reference. |
申请公布号 |
US2016004153(A1) |
申请公布日期 |
2016.01.07 |
申请号 |
US201414768787 |
申请日期 |
2014.02.20 |
申请人 |
HOYA CORPORATION |
发明人 |
SHOKI Tsutomu;HAMAMOTO Kazuhiro;IKEBE Yohei |
分类号 |
G03F1/84;G06T7/00;G03F1/24;C23C14/35;C23C14/46 |
主分类号 |
G03F1/84 |
代理机构 |
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代理人 |
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主权项 |
1. A method of manufacturing a reflective mask blank comprising a multilayer reflective film formed on a substrate so as to reflect EUV light; and a laminated film formed on the multilayer reflective film;
the method comprising the steps of: depositing the multilayer reflective film on the substrate to form a multilayer reflective film formed substrate; carrying out defect inspection for the multilayer reflective film formed substrate; depositing the laminated film on the multilayer reflective film of the multilayer reflective film formed substrate; forming a fiducial mark for an upper portion of the laminated film to thereby form a reflective mask blank comprising the fiducial mark, the fiducial mark serving as a reference for a defect position in defect information; and carrying out defect inspection of the reflective mask blank by using the fiducial mark as a reference. |
地址 |
Shinjuku-ku, Tokyo JP |