ETCHING SOLUTION COMPOSITION FOR METAL LAYER AND MANUFACTURING METHOD OF AN ARRAY SUBSTRATE FOR LIQUID CRYSTAL DISPLAY USING THE SAME
摘要
The present invention provides an etching solution composition comprising: a metal film oxidizing agent; a crown ether compound described as a chemical formula 1; and water.
申请公布号
KR20160001295(A)
申请公布日期
2016.01.06
申请号
KR20140079556
申请日期
2014.06.27
申请人
DONGWOO FINE-CHEM CO., LTD.
发明人
CHOI, HAN YOUNG;KIM, HYOUN WOO;JEON, HYUN SU;CHO, SEONG BAE
