发明名称 |
ETCHING SOLUTION COMPOSITION FOR METAL LAYER AND MANUFACTURING METHOD OF AN ARRAY SUBSTRATE FOR LIQUID CRYSTAL DISPLAY USING THE SAME |
摘要 |
Provided is an etching solution composition comprising: an oxidizing agent for a metal layer; a polyaminoether compound including two or more amino groups and one or more ether groups in molecules; and water. Therefore, the present invention provides excellent work safety, etching speed, and storage stability and enables the treatment of a great deal of substrates. |
申请公布号 |
KR20160001291(A) |
申请公布日期 |
2016.01.06 |
申请号 |
KR20140079552 |
申请日期 |
2014.06.27 |
申请人 |
DONGWOO FINE-CHEM CO., LTD. |
发明人 |
CHOI, HAN YOUNG;KIM, HYOUN WOO;LEE, JOON WOO;JEON, HYUN SU;CHO, SEONG BAE |
分类号 |
C23F1/14;C09K13/04;C23F1/18;H01L21/306 |
主分类号 |
C23F1/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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