发明名称 ETCHING SOLUTION COMPOSITION FOR METAL LAYER AND MANUFACTURING METHOD OF AN ARRAY SUBSTRATE FOR LIQUID CRYSTAL DISPLAY USING THE SAME
摘要 Provided is an etching solution composition comprising: an oxidizing agent for a metal layer; a polyaminoether compound including two or more amino groups and one or more ether groups in molecules; and water. Therefore, the present invention provides excellent work safety, etching speed, and storage stability and enables the treatment of a great deal of substrates.
申请公布号 KR20160001291(A) 申请公布日期 2016.01.06
申请号 KR20140079552 申请日期 2014.06.27
申请人 DONGWOO FINE-CHEM CO., LTD. 发明人 CHOI, HAN YOUNG;KIM, HYOUN WOO;LEE, JOON WOO;JEON, HYUN SU;CHO, SEONG BAE
分类号 C23F1/14;C09K13/04;C23F1/18;H01L21/306 主分类号 C23F1/14
代理机构 代理人
主权项
地址