SUBSTRATE PROCESSING APPARATUS, SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND STORAGE MEDUIM

摘要

The present invention can suppress generation of by-products in even a device with a complicated shower head structure. Provided is a substrate processing apparatus which comprises: a cover of a shower head having a penetration hole formed therein; a first distribution device of which a leading end is inserted into the penetration hole and the other end is connected to a gas supply part; a plate part configured to have a wider width downwardly; a gas guide which is installed between the plate part and the cover and has a connection part having at least one hole formed therein; a second distribution device installed in a down-stream of the gas guide; a shower head having the cover, the first distribution device, the gas guide, and the second distribution device; and a processing space prepared in a down-stream of the shower head.