| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a film thickness measuring method, a film thickness measuring system, and a film thickness measuring device capable of simply and highly accurately measuring a film thickness of a thin film comprising an alkali metal with high chemical reaction, an alkali earth metal, and the like. <P>SOLUTION: The film thickness measuring method according to one embodiment of the present invention includes: forming a thin film comprising an alkali metal or an alkali earth metal, on a plurality of transducers 11 that are disposed on a measuring base plate 10 placed on a stage 22 in a deposition chamber 2. The measuring base plate 10 is conveyed to the interior of a measuring chamber 3 that is controlled to a low humidity from the outside. In the measuring chamber 3, the transducers 11 are connected to a detection unit 32 and oscillated so as to measure the film thickness of the thin film. <P>COPYRIGHT: (C)2013,JPO&INPIT</p> |
