POSITION DETECTION APPARATUS, POSITION DETECTION METHOD, IMPRINT APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

摘要

The present invention provides a position detection apparatus. The position detection apparatus includes a detection unit which detects moire generated by an overlap between a first diffraction grid including a pattern arranged in a first direction and a second diffraction grid including a pattern arranged in the first direction; and a process unit which obtains a relative position of the first diffraction grid and the second diffraction grid, based on the moire. The width of an end pattern of the pattern in the first direction, included in at least one diffraction grid of the first diffraction grid and the second diffraction grid, is smaller than that of the remaining pattern of the at least one diffraction grid in the first direction.