发明名称 ETCHING SOLUTION COMPOSITION FOR METAL LAYER AND MANUFACTURING METHOD OF AN ARRAY SUBSTRATE FOR LIQUID CRYSTAL DISPLAY USING THE SAME
摘要 The present invention provides an etching solution composition wherein the etching speed of the time when the 5000 sheets are processed relative to the etching speed of the time when the 100 sheets are processed is 0.9 to 1 and a method for manufacturing an array substrate for a liquid crystal display device using the composition. The etching solution composition comprises: a metal film oxidizing agent; a compound containing fluorine; phosphoric acid; glycols; and the remaining water.
申请公布号 KR20160001239(A) 申请公布日期 2016.01.06
申请号 KR20140079389 申请日期 2014.06.27
申请人 DONGWOO FINE-CHEM CO., LTD. 发明人 CHOI, HAN YOUNG;KIM, HYOUN WOO;JEON, HYUN SU;CHO, SEONG BAE;KIM, SANG TAE;LEE, JOON WOO
分类号 C23F1/14;C09K13/04;C23F1/18 主分类号 C23F1/14
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