CHEMICAL MECHANICAL POLISHING COMPOSITION AND METHOD FOR POLISHING TUNGSTEN

摘要

The present invention relates to a chemical-mechanical polishing composition and a method for polishing tungsten. More specifically, the present invention provides a composition and a method for tungsten comprising: a metal oxide abrasive; an oxidizer; a substance for improving a tungsten removal rate according to chemical formula I; and water, wherein the polishing composition has an improved tungsten removal rate and shows an increase in the tungsten removal rate.