| 摘要 |
<p>PROBLEM TO BE SOLVED: To increase a deposition rate by inducing magnetic flux lines toward a substrate in an arc evaporation source.SOLUTION: An arc evaporation source includes: one or more outer peripheral magnets 3 which are arranged so as to surround the outer periphery of a target 2 and have magnetization directions extending along the direction orthogonal to the target surface; and a back-side magnet 4A arranged on the back side of the target 2. The back-side magnet 4A has: a first non-ring-shaped permanent magnet which has polarity in the same direction as that of the outer peripheral magnets 3 and is arranged so that its magnetization direction extends along the direction orthogonal to the target surface; and a non-ring-shaped second permanent magnet which is arranged between the first permanent magnet and the target 2 or on the back side of the first permanent magnet and at an interval from the first magnet. The second permanent magnet has polarity in the same direction as that of the outer peripheral magnets 3 and is arranged so that its magnetization direction extends along the direction orthogonal to the target surface.</p> |
