发明名称 ポーリング処理方法、磁場ポーリング装置及び圧電体膜
摘要 <p>To perform poling treatment in a simple procedure by dry process. An aspect of the invention is a magnetic field poling device including: a first holding part configured to hold a film-to-be-poled 2; a second holding part configured to hold a magnet generating a magnetic field B to the film-to-be-poled 2; and a moving mechanism configured to move the first holding part or the second holding part in a direction perpendicular to the direction of the magnetic field B.</p>
申请公布号 JP5838417(B2) 申请公布日期 2016.01.06
申请号 JP20130538405 申请日期 2011.10.14
申请人 株式会社ユーテック 发明人 木島 健;本多 祐二;荒木 智幸
分类号 H01L41/257 主分类号 H01L41/257
代理机构 代理人
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