| 摘要 |
A material including a substrate coated on at least some of at least one of its faces with a thin-film multilayer including at least two films based on a transparent electrically conductive oxide, the films being separated by at least one dielectric intermediate film the physical thickness of which is at most 50 nm, no metal films being deposited between the films based on a transparent electrically conductive oxide, the multilayer furthermore including at least one oxygen barrier film above that film based on a transparent electrically conductive oxide which is furthest from the substrate, each film based on a transparent electrically conductive oxide possessing a physical thickness comprised in a range extending from 20 to 80 nm. |
