发明名称 ETCHING SOLUTION COMPOSITION FOR METAL LAYER AND MANUFACTURING METHOD OF AN ARRAY SUBSTRATE FOR LIQUID CRYSTAL DISPLAY USING THE SAME
摘要 Provided are an etching solution composition for a metal layer and a manufacturing method of an array substrate for a liquid crystal display using the same. The etching solution composition for a metal layer comprises: an oxidizing agent for a metal layer; a fluorinated compound; a thioacid; and water.
申请公布号 KR20160001385(A) 申请公布日期 2016.01.06
申请号 KR20140079817 申请日期 2014.06.27
申请人 DONGWOO FINE-CHEM CO., LTD. 发明人 CHOI, HAN YOUNG;KIM, HYOUN WOO;JEON, HYUN SU;CHO, SEONG BAE
分类号 C23F1/14;C09K13/04;C23F1/18;H01L21/306 主分类号 C23F1/14
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