发明名称 |
ETCHING SOLUTION COMPOSITION FOR METAL LAYER AND MANUFACTURING METHOD OF AN ARRAY SUBSTRATE FOR LIQUID CRYSTAL DISPLAY USING THE SAME |
摘要 |
Provided are an etching solution composition for a metal layer and a manufacturing method of an array substrate for a liquid crystal display using the same. The etching solution composition for a metal layer comprises: an oxidizing agent for a metal layer; a fluorinated compound; a thioacid; and water. |
申请公布号 |
KR20160001385(A) |
申请公布日期 |
2016.01.06 |
申请号 |
KR20140079817 |
申请日期 |
2014.06.27 |
申请人 |
DONGWOO FINE-CHEM CO., LTD. |
发明人 |
CHOI, HAN YOUNG;KIM, HYOUN WOO;JEON, HYUN SU;CHO, SEONG BAE |
分类号 |
C23F1/14;C09K13/04;C23F1/18;H01L21/306 |
主分类号 |
C23F1/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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