发明名称 ETCHING SOLUTION COMPOSITION FOR METAL LAYER AND MANUFACTURING METHOD OF AN ARRAY SUBSTRATE FOR LIQUID CRYSTAL DISPLAY USING THE SAME
摘要 Provided are an etching solution composition for a metal layer and a manufacturing method of an array substrate for a liquid crystal display using the same. The etching solution composition for a metal layer comprises: an oxidizing agent for a metal layer; saccharide; and water. The manufacturing method of an array substrate for a liquid crystal display uses the etching solution composition. Therefore, the present invention provides excellent work safety, etching speed, and storage stability.
申请公布号 KR20160001289(A) 申请公布日期 2016.01.06
申请号 KR20140079550 申请日期 2014.06.27
申请人 DONGWOO FINE-CHEM CO., LTD. 发明人 CHOI, HAN YOUNG;KIM, HYOUN WOO;LEE, JOON WOO;JEON, HYUN SU;CHO, SEONG BAE
分类号 C23F1/14;C09K13/04;C23F1/18;H01L21/306 主分类号 C23F1/14
代理机构 代理人
主权项
地址