Exposure apparatus, movable body drive system, pattern formation apparatus, exposure method, and device manufacturing method

摘要

While a wafer stage moves linearly in a Y-axis direction, surface position information of a wafer surface at a plurality of detection points set at a predetermined interval in an X-axis direction is detected by a multipoint AF system, and by a plurality of alignment systems arranged in a line along the X-axis direction, marks at different positions on the wafer are each detected, and a part of a chipped shot of the wafer is exposed by a periphery edge exposure system. This allows throughput to be improved when compared with the case when detection operation of the marks, detection operation of the surface position information (focus information), and periphery edge exposure operation are performed independently.

主权项

1. A movable body drive system which drives a movable body substantially along a predetermined plane, the system comprising:
an encoder system which has a head irradiating a detection beam on a scale having a two-dimensional grating whose periodic directions are a first direction and a second direction orthogonal to each other within a plane parallel to the predetermined plane and receiving light from the scale, and measures positional information of the movable body at least in directions of two degrees of freedom within the predetermined plane including the first and the second directions based on measurement values of the head; and a drive device which drives the movable body along the predetermined plane based on measurement information of the encoder system, wherein the drive device drives the movable body so that a measurement error of the encoder system that occurs due to at least one of the head and the scale is compensated for.