发明名称 Method for producing bi-polar complementary structure patterns
摘要 The embodiments disclose a method including creating at least one first structure including magnetically isolated features in servo fields, and creating at least one second structure including finger-structure patterns including intentional weak nucleation points in servo fields to create a regular bi-polar magnetization direction after bulk DC initialization, and wherein the first and second structures form bi-polar complementary structure patterns.
申请公布号 US9230589(B2) 申请公布日期 2016.01.05
申请号 US201414199882 申请日期 2014.03.06
申请人 Seagate Technology LLC 发明人 Steiner Philip;van de Veerdonk René J. M.
分类号 G11B5/855;H01F7/02;H01F41/02;G11B5/74;G11B5/596 主分类号 G11B5/855
代理机构 代理人
主权项 1. A method, comprising: creating at least one first structure including magnetically isolated features in servo fields; and creating at least one second structure including finger-structure patterns including intentional weak nucleation points in servo fields to create a regular bi-polar magnetization direction after bulk DC initialization, and wherein the first and second structures form bi-polar complementary structure patterns.
地址 Cupertino CA US