发明名称 Semiconductor device and a manufacturing method thereof
摘要 There is provided a technology capable of suppressing the damage applied to a pad. When the divergence angle of an inner chamfer part is smaller than 90 degrees, the ultrasonic conversion load in a direction perpendicular to the surface of the pad is very small in magnitude. In other words, the ultrasonic conversion load in a direction perpendicular to the surface of the pad is sufficiently smaller in magnitude than the ultrasonic conversion load in a direction in parallel with the surface of the pad. Consequently, when the divergence angle of the inner chamfer part is smaller than 90 degrees, the ultrasonic conversion load in a direction perpendicular to the surface of the pad can be sufficiently reduced in magnitude, which can prevent pad peeling.
申请公布号 US9230937(B2) 申请公布日期 2016.01.05
申请号 US201213468139 申请日期 2012.05.10
申请人 Renesas Electronics Corporation 发明人 Sumitomo Kaori;Arakawa Hideyuki;Horibe Hiroshi;Takata Yasuki
分类号 H01L21/44;H01L23/00 主分类号 H01L21/44
代理机构 Miles & Stockbridge P.C. 代理人 Miles & Stockbridge P.C.
主权项 1. A method for manufacturing a semiconductor device, comprising a step of bonding a copper wire to a pad disposed over the surface of a semiconductor chip, wherein the step of bonding the copper wire, comprises the steps of: (a) forming an initial ball formed of the copper wire at a tip part of a capillary; (b) landing the initial ball over the pad; (c) applying the initial ball with a load and an ultrasonic wave, and thereby deforming the initial ball to form a press-bonded ball, and electrically coupling the pad with the press-bonded ball; and (d) leading out the copper wire from the capillary, wherein the press-bonded ball has a first portion coupled with the pad, a second portion located over the first portion, and a third portion located over the second portion, and coupled with the copper wire led out in step (d), wherein, in step (c) and step (d), the initial ball is electrically coupled with the pad such that, in cross-sectional view, a thickness of the first portion of the press-bonded ball is 1.25 times or more the thickness of the second portion, the thickness of the first portion of the press-bonded ball is 2/9 or more of the diameter of the press-bonded ball, and the thickness of the third portion of the press-bonded ball is smaller than 1/6 of the diameter of the press-bonded ball, and wherein a divergence angle of an inner chamfer part of the capillary forming the second portion of the press-bonded ball is smaller than 90 degrees.
地址 Tokyo JP