发明名称 Semiconductor wafer weight metrology apparatus
摘要 A semiconductor wafer metrology technique comprising performing atmospheric buoyancy compensated weighing of a wafer, in which the wafer is weighed in a substantially upright condition. A vertical or near vertical wafer orientation causes the surface area in the direction of a force (weight) sensor to be reduced compared with a horizontal wafer orientation. Hence, the electrostatic force components acting in the same direction as the wafer weight force component is reduced.
申请公布号 US9228886(B2) 申请公布日期 2016.01.05
申请号 US201213686265 申请日期 2012.11.27
申请人 METRYX LIMITED 发明人 Wilby Robert John
分类号 H01L21/66;G01G9/00;G01G21/22;G01G21/28;H01L21/67;G01G23/01;G01G23/16 主分类号 H01L21/66
代理机构 Stites & Harbison PLLC 代理人 Weyer Stephen J.;Stites & Harbison PLLC
主权项 1. Apparatus for measuring the mass of a semiconductor wafer, the apparatus having: a weighing instrument for measuring the weight of the wafer; a chamber for containing the wafer during measurement, said chamber having a sufficient shape to accommodate the wafer while reducing air current effects on the wafer when weighing the wafer; monitoring means arranged to determine the buoyancy exerted on the wafer by the atmosphere in the chamber; and a wafer holder arranged to support the plane of the wafer in a substantially upright orientation when the wafer's weight is measured.
地址 Bristol GB