发明名称 |
Semiconductor wafer weight metrology apparatus |
摘要 |
A semiconductor wafer metrology technique comprising performing atmospheric buoyancy compensated weighing of a wafer, in which the wafer is weighed in a substantially upright condition. A vertical or near vertical wafer orientation causes the surface area in the direction of a force (weight) sensor to be reduced compared with a horizontal wafer orientation. Hence, the electrostatic force components acting in the same direction as the wafer weight force component is reduced. |
申请公布号 |
US9228886(B2) |
申请公布日期 |
2016.01.05 |
申请号 |
US201213686265 |
申请日期 |
2012.11.27 |
申请人 |
METRYX LIMITED |
发明人 |
Wilby Robert John |
分类号 |
H01L21/66;G01G9/00;G01G21/22;G01G21/28;H01L21/67;G01G23/01;G01G23/16 |
主分类号 |
H01L21/66 |
代理机构 |
Stites & Harbison PLLC |
代理人 |
Weyer Stephen J.;Stites & Harbison PLLC |
主权项 |
1. Apparatus for measuring the mass of a semiconductor wafer, the apparatus having:
a weighing instrument for measuring the weight of the wafer; a chamber for containing the wafer during measurement, said chamber having a sufficient shape to accommodate the wafer while reducing air current effects on the wafer when weighing the wafer; monitoring means arranged to determine the buoyancy exerted on the wafer by the atmosphere in the chamber; and a wafer holder arranged to support the plane of the wafer in a substantially upright orientation when the wafer's weight is measured. |
地址 |
Bristol GB |