| 摘要 |
A stripping solution for titanium or a titanium compound wherein a superior stripping removal performance of the solution can be stably maintained when the solution is continuously circulated, and a method for wiring formation by using the stripping solution are provided. According to the present invention, the stripping solution for titanium or a titanium compound comprises an alkaline compound, hydrogen peroxide, water, and at least one type of a chelating agent selected from a group made of an alkali metal silicate and a bisphosphonate compound. It is desired that the titanium compound is titanium nitride. Additionally, it is desired that the stripping solution is a stripping solution of a hard mask, which is made of titanium or a titanium compound. |
