发明名称 |
PREPARATION METHOD OF PATTERNED FILM, DISPLAY SUBSTRATE AND DISPLAY DEVICE |
摘要 |
Embodiments of the present invention provide a preparation method of a patterned film, a display substrate and a display device, avoiding falling off of a film layer occurring in the process of peeling off a photoresist layer. The preparation method of the patterned film comprises: forming a preset film layer on a surface of a preset substrate; covering the preset film layer with an isolation layer; forming a photoresist layer on a surface of the isolation layer and forming a pattern of the isolation layer with a patterning process; then removing the preset film layer which is not covered by the pattern of the isolation layer, peeling off the photoresist layer and removing the remaining, isolation layer to form a pattern of the preset film layer. |
申请公布号 |
US2015382475(A1) |
申请公布日期 |
2015.12.31 |
申请号 |
US201414527134 |
申请日期 |
2014.10.29 |
申请人 |
BOE TECHNOLOGY GROUP CO., LTD. |
发明人 |
Li Lin;Tang Chen;Xin Yangyang;Chang Shan |
分类号 |
H05K3/06;H05K1/02;H05K1/09 |
主分类号 |
H05K3/06 |
代理机构 |
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代理人 |
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主权项 |
1. A preparation method of a patterned film, wherein the method comprises:
forming a preset film layer on a surface of a preset substrate; forming an isolation layer on a surface of the preset film layer; forming a photoresist layer on a surface of the isolation layer and forming a pattern of the isolation layer with a patterning process; removing the preset film layer which is not covered by the pattern of the isolation layer; and peeling off the photoresist layer, removing the pattern of the isolation layer to form a pattern of the preset film layer. |
地址 |
Beijing CN |