发明名称 PREPARATION METHOD OF PATTERNED FILM, DISPLAY SUBSTRATE AND DISPLAY DEVICE
摘要 Embodiments of the present invention provide a preparation method of a patterned film, a display substrate and a display device, avoiding falling off of a film layer occurring in the process of peeling off a photoresist layer. The preparation method of the patterned film comprises: forming a preset film layer on a surface of a preset substrate; covering the preset film layer with an isolation layer; forming a photoresist layer on a surface of the isolation layer and forming a pattern of the isolation layer with a patterning process; then removing the preset film layer which is not covered by the pattern of the isolation layer, peeling off the photoresist layer and removing the remaining, isolation layer to form a pattern of the preset film layer.
申请公布号 US2015382475(A1) 申请公布日期 2015.12.31
申请号 US201414527134 申请日期 2014.10.29
申请人 BOE TECHNOLOGY GROUP CO., LTD. 发明人 Li Lin;Tang Chen;Xin Yangyang;Chang Shan
分类号 H05K3/06;H05K1/02;H05K1/09 主分类号 H05K3/06
代理机构 代理人
主权项 1. A preparation method of a patterned film, wherein the method comprises: forming a preset film layer on a surface of a preset substrate; forming an isolation layer on a surface of the preset film layer; forming a photoresist layer on a surface of the isolation layer and forming a pattern of the isolation layer with a patterning process; removing the preset film layer which is not covered by the pattern of the isolation layer; and peeling off the photoresist layer, removing the pattern of the isolation layer to form a pattern of the preset film layer.
地址 Beijing CN