| 主权项 |
1. A photosensitive resin composition, comprising:
a polysiloxane resin (A), obtained by polycondensing a silane monomer shown as Formula (I):
Si(Y1)a(OY2)4-a (I) in the Formula (I), the Y1 respectively represents a hydrogen atom, an alkyl group of 1 to 10 carbons, an alkene group of 2 to 10 carbons, an aromatic group of 6 to 15 carbons, an alkyl group having an anhydride group, an alkyl group having an epoxy group or an alkoxy group having an epoxy group; the Y2 respectively represents a hydrogen atom, an alkyl group of 1 to 6 carbons, an acetyl group of 1 to 6 carbons or an aromatic group of 6 to 15 carbons; and the a represents an integer of 0 to 3; an alkali-soluble resin (B) copolymerized by an unsaturated carboxylic acid or unsaturated carboxylic anhydride compound (b1), a fluorene derivative having a double-bond group (b2) and an unsaturated compound having an acid-decomposable group (b3); an ortho-naphthoquinone diazide sulfonic acid ester (C); and a solvent (D). |
