METHODS FOR FABRICATING A CHEMICAL-MECHANICAL POLISHING COMPOSITION

摘要

Methods for fabricating a chemical-mechanical polishing composition include growing colloidal silica abrasive particles in a liquid including an aminosilane compound such that the aminosilane compound becomes incorporated in the abrasive particles. A dispersion including such colloidal silica abrasive particles may be further processed to obtain a chemical-mechanical polishing composition including colloidal silica particles having the aminosilane compound incorporated therein.

主权项

1. A method for manufacturing a chemical mechanical polishing composition, the method comprising:
(a) providing a liquid solution; (b) combining the liquid solution, a silica producing compound, and an aminosilane compound thereby causing colloidal silica particles to grow such that a dispersion is obtained including colloidal silica particles having the aminosilane compound incorporated therein; and (c) processing the dispersion to obtain a chemical mechanical polishing composition including colloidal silica particles having the aminosilane compound incorporated therein, the processing including adjusting a pH of the dispersion to a value in a range from about 1.5 to about 7 and diluting the dispersion such that the colloidal silica particles make up less than 20 percent by weight of the polishing composition.