发明名称 P-N JUNCTION OPTOELECTRONIC DEVICE FOR IONIZING DOPANTS BY FIELD EFFECT
摘要 An optoelectronic device comprising a mesa structure including: a first and a second semiconductor portions forming a p-n junction,a first electrode electrically connected to the first portion which is arranged between the second portion and the first electrode,the device further comprising:a second electrode electrically connected to the second portion,an element able to ionize dopants of the first and/or second semiconductor portion through generating an electric field in the first and/or second semiconductor portion and overlaying at least one part of the side flanks of at least one part of the first and/or second semiconductor portion and of at least one part of a space charge zone formed by the first and second semiconductor portions,upper faces of the first electrode and of the second electrode form a substantially planar continuous surface.
申请公布号 US2015380461(A1) 申请公布日期 2015.12.31
申请号 US201514750156 申请日期 2015.06.25
申请人 Commissariat a L'Energie Atomique et aux Energies Alternatives 发明人 ROBIN Ivan-Christophe;Bono Hubert
分类号 H01L27/15;H01L33/24;H01L33/38;H01L31/113;H01L31/0352;H01L31/0224;H01L27/144;H01L33/00;H01L31/18 主分类号 H01L27/15
代理机构 代理人
主权项 1. An optoelectronic device having at least one mesa structure including at least: a first and a second semiconductor portions, one being p-doped and the other being n-doped, and forming together a p-n junction, a first electrode electrically connected to the first semiconductor portion which is arranged between the second semiconductor portion and the first electrode, the optoelectronic device further comprising at least: a second electrode electrically connected to the second semiconductor portion, an element able to ionize dopants of the first and/or second semiconductor portion through generating an electric field in the first and/or second semiconductor portion and overlaying at least one part of the side flanks of at least one part of the first and/or second semiconductor portion and of at least one part of a space charge zone formed by the first and second semiconductor portions, and wherein upper faces of at least the first electrode and of the second electrode form a substantially planar continuous surface.
地址 Paris FR