发明名称 |
METHOD OF GROWING NITRIDE SEMICONDUCTOR LAYER, NITRIDE SEMICONDUCTOR DEVICE, AND METHOD OF FABRICATING THE SAME |
摘要 |
Exemplary embodiments of the present invention provide a method of growing a nitride semiconductor layer including growing a gallium nitride-based defect dispersion suppressing layer on a gallium nitride substrate including non-defect regions and a defect region disposed between the non-defect regions, and growing a gallium nitride semiconductor layer on the defect dispersion suppressing layer. |
申请公布号 |
US2015380237(A1) |
申请公布日期 |
2015.12.31 |
申请号 |
US201514829501 |
申请日期 |
2015.08.18 |
申请人 |
Seoul Viosys Co., Ltd. |
发明人 |
Kwak Woo Chul;Choi Seung Kyu;Song Jae Hoon;Kim Chae Hon;Jung Jung Whan |
分类号 |
H01L21/02 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
Ansan-Si KR |