发明名称 |
Mesoporous Structure Solar Cell with Siloxane Barrier |
摘要 |
A method is provided for forming a mesoporous-structured solar cell with a silane or siloxane barrier. The method forms a transparent conductive electrode overlying a transparent substrate. A non-mesoporous layer of a first metal oxide overlies the transparent conductive electrode, with a mesoporous layer of a second metal oxide overlying the non-mesoporous layer of first metal oxide. An aminoalkoxysilane layer overlies the mesoporous layer of second metal oxide. Over the aminoalkoxysilane layer is deposited a semiconductor absorber layer comprising organic and inorganic components. Using the aminoalkoxysilane linker, the mesoporous layer of second metal oxide is linked to the semiconductor absorber layer. A hole-transport material (HTM) layer is formed overlying the semiconductor absorber layer, and a metal electrode overlies the HTM layer. A mesoporous-structured solar cell with a silane or siloxane barrier is also provided. |
申请公布号 |
US2015380170(A1) |
申请公布日期 |
2015.12.31 |
申请号 |
US201414320702 |
申请日期 |
2014.07.01 |
申请人 |
Sharp Laboratories of America, Inc. |
发明人 |
Koposov Alexey;Zhan Changqing;Pan Wei |
分类号 |
H01G9/20;H01L51/00 |
主分类号 |
H01G9/20 |
代理机构 |
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代理人 |
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主权项 |
1. A mesoporous-structured solar cell with a silane or siloxane barrier, the solar cell comprising:
a transparent substrate; a transparent conductive electrode overlying the transparent substrate; a non-mesoporous layer of a first metal oxide overlying the transparent conductive electrode; a mesoporous layer of a second metal oxide overlying the non-mesoporous layer of first metal oxide; a semiconductor absorber layer overlying the mesoporous layer of second metal oxide, comprising organic and inorganic components; an aminoalkoxysilane linker linking the semiconductor absorber layer to the mesoporous layer of second metal oxide; a hole-transport material (HTM) layer overlying the semiconductor absorber layer; and, a metal electrode overlying the HTM layer. |
地址 |
Camas WA US |