发明名称 SOLUBLE, PROCESSABLE POLYHEMIAMINALS AND POLYHEXAHYDROTRIAZINES
摘要 Polyhexahydrotriazine (PHT) and polyhemiaminal (PHA) materials incorporating divalent or trivalent bridging groups tend to form highly cross-linked polymers. While highly cross-linked polymers have certain advantageous with respect to stability and various physical characteristics, they are difficult to process once formed. PHA and PHT materials incorporating a plurality of trivalent PHA/PHT groups, a plurality of divalent bridging groups, and a plurality of monovalent end groups are disclosed. According to an embodiment, the cross-link density and molecular weight can be controlled by the inclusion of the end groups. Lower cross-link density and molecular weight give PHA and PHT materials improved characteristics with respect to film and fiber formation methods. A method of coating a component or substrate with a polymer is also disclosed. Embodiments of the method can be used to form either a PHA or PHT film on a substrate, such as microelectronic component.
申请公布号 US2015376442(A1) 申请公布日期 2015.12.31
申请号 US201414571130 申请日期 2014.12.15
申请人 International Business Machines Corporation 发明人 BODAY Dylan J.;GARCIA Jeannette M.;HEDRICK James L.;WOJTECKI Rudy J.
分类号 C09D161/20 主分类号 C09D161/20
代理机构 代理人
主权项 1. A method of coating a component with a polymer, the method comprising: forming a polyhemiaminal (PHA) film on a substrate, the PHA film comprising: a plurality of trivalent hemiaminal groups having the structure: a plurality of bridging groups having the structure: wherein y′ is 2 or 3, and K′ is a divalent or trivalent radical comprising at least one 6-carbon aromatic ring; anda plurality of end groups having the structure: K″—*,wherein K″ is a monovalent radical comprising at least one carbon, andeach starred bond of in the plurality of trivalent hemiaminal groups is covalently linked to a starred bond of the plurality of bridging groups or a starred bond of plurality of end groups; and heating the PHA film to a first temperature above a glass transition temperature of the PHA film.
地址 Armonk NY US