发明名称 |
SOLUBLE, PROCESSABLE POLYHEMIAMINALS AND POLYHEXAHYDROTRIAZINES |
摘要 |
Polyhexahydrotriazine (PHT) and polyhemiaminal (PHA) materials incorporating divalent or trivalent bridging groups tend to form highly cross-linked polymers. While highly cross-linked polymers have certain advantageous with respect to stability and various physical characteristics, they are difficult to process once formed. PHA and PHT materials incorporating a plurality of trivalent PHA/PHT groups, a plurality of divalent bridging groups, and a plurality of monovalent end groups are disclosed. According to an embodiment, the cross-link density and molecular weight can be controlled by the inclusion of the end groups. Lower cross-link density and molecular weight give PHA and PHT materials improved characteristics with respect to film and fiber formation methods. A method of coating a component or substrate with a polymer is also disclosed. Embodiments of the method can be used to form either a PHA or PHT film on a substrate, such as microelectronic component. |
申请公布号 |
US2015376442(A1) |
申请公布日期 |
2015.12.31 |
申请号 |
US201414571130 |
申请日期 |
2014.12.15 |
申请人 |
International Business Machines Corporation |
发明人 |
BODAY Dylan J.;GARCIA Jeannette M.;HEDRICK James L.;WOJTECKI Rudy J. |
分类号 |
C09D161/20 |
主分类号 |
C09D161/20 |
代理机构 |
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代理人 |
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主权项 |
1. A method of coating a component with a polymer, the method comprising:
forming a polyhemiaminal (PHA) film on a substrate, the PHA film comprising:
a plurality of trivalent hemiaminal groups having the structure: a plurality of bridging groups having the structure: wherein y′ is 2 or 3, and K′ is a divalent or trivalent radical comprising at least one 6-carbon aromatic ring; anda plurality of end groups having the structure:
K″—*,wherein K″ is a monovalent radical comprising at least one carbon, andeach starred bond of in the plurality of trivalent hemiaminal groups is covalently linked to a starred bond of the plurality of bridging groups or a starred bond of plurality of end groups; and heating the PHA film to a first temperature above a glass transition temperature of the PHA film. |
地址 |
Armonk NY US |