发明名称 |
COMPOUND, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY AND PATTERN FORMING METHOD |
摘要 |
The material for forming an underlayer film for lithography of the present invention contains a compound having a structure represented by the following general formula (1).;;(in formula (1), each X independently represents an oxygen atom or a sulfur atom, R1 represents a single bond or a 2n-valent hydrocarbon group having 1 to 30 carbon atoms, the hydrocarbon group may have a cyclic hydrocarbon group, a double bond, a hetero atom or an aromatic group having 6 to 30 carbon atoms, R2 represents a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, or a hydroxyl group, m is an integer of 0 to 3, n is an integer of 1 to 4, p is 0 or 1, and q is an integer of 1 to 100.) |
申请公布号 |
US2015376202(A1) |
申请公布日期 |
2015.12.31 |
申请号 |
US201414766499 |
申请日期 |
2014.02.04 |
申请人 |
MITSUBISHI GAS CHEMICAL COMPANY, INC. |
发明人 |
Echigo Masatoshi;Makinoshima Takashi;Uchiyama Naoya |
分类号 |
C07D493/14;G03F7/11;G03F7/32;G03F7/16;G03F7/20;C07D493/04;C09D7/12 |
主分类号 |
C07D493/14 |
代理机构 |
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代理人 |
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主权项 |
1. A material for forming an underlayer film for lithography, comprising a compound having a structure represented by the following general formula (1).(in formula (1), each X independently represents an oxygen atom or a sulfur atom, R1 represents a single bond or a 2n-valent hydrocarbon group having 1 to 30 carbon atoms, the hydrocarbon group may have a cyclic hydrocarbon group, a double bond, a hetero atom or an aromatic group having 6 to 30 carbon atoms, R2 represents a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, or a hydroxyl group, m is an integer of 0 to 3, n is an integer of 1 to 4, p is 0 or 1, and q is an integer of 1 to 100.) |
地址 |
Chiyoda-ku, Tokyo JP |