发明名称 THIN-FILM AMBIPOLAR LOGIC
摘要 An ambipolar electronic device is disclosed. The device may include a field-effect transistor (FET), which may have a handle substrate layer, two contacts and an inorganic crystalline layer between the handle substrate layer and the contacts. The inorganic crystalline layer may have a doped channel region between the contacts. The FET may also have a dielectric layer between the contacts, attached to the inorganic crystalline layer, and a gate layer, attached to the dielectric layer. The FET may conduct current, in response to a first gate voltage applied to the gate layer, using electrons as a majority carrier, along the length of the channel region between the contacts. The FET may also conduct current, in response to a second gate voltage applied to the gate layer, using holes as a majority carrier, along the length of the channel region between the contacts.
申请公布号 US2015380440(A1) 申请公布日期 2015.12.31
申请号 US201414318846 申请日期 2014.06.30
申请人 International Business Machines Corporation 发明人 Hekmatshoartabari Bahman;Shahidi Ghavam G.
分类号 H01L27/12;H01L29/66;H01L29/45;H01L29/786;H01L21/762;H01L21/285 主分类号 H01L27/12
代理机构 代理人
主权项 1. An ambipolar electronic device comprising: a first FET (field-effect transistor) having: a handle substrate layer;a first contact;a second contact;an inorganic crystalline layer formed between a top surface of the handle substrate layer and the first and second contacts and having a channel region with a length extending between the first contact and the second contact;a dielectric layer attached, between the first contact and the second contact, to a top surface of the inorganic crystalline layer; anda gate layer, attached to a top surface of the dielectric layer;wherein the first FET is configured to: conduct current, in response to a first gate voltage applied to the gate layer and using electrons as a majority carrier, along the length of the channel region between the first contact and the second contact;conduct current, in response to a second gate voltage applied to the gate layer and using holes as a majority carrier, along the length of the channel region between the first contact and the second contact.
地址 Armonk NY US