| 发明名称 |
SYSTEMS AND METHODS OF MODULATING FLOW DURING VAPOR JET DEPOSITION OF ORGANIC MATERIALS |
| 摘要 |
Embodiments of the disclosed subject matter provide methods and systems including a nozzle, a source of material to be deposited on a substrate in fluid communication with the nozzle, a delivery gas source in fluid communication with the source of material to be deposited with the nozzle, an exhaust channel disposed adjacent to the nozzle, a confinement gas source in fluid communication with the nozzle and the exhaust channel, and disposed adjacent to the exhaust channel, and an actuator to adjust a fly height separation between a deposition nozzle aperture of the nozzle and a deposition target. The adjustment of the fly height separation may stop and/or start the deposition of the material from the nozzle. |
| 申请公布号 |
US2015380648(A1) |
申请公布日期 |
2015.12.31 |
| 申请号 |
US201514730768 |
申请日期 |
2015.06.04 |
| 申请人 |
Universal Display Corporation |
发明人 |
McGRAW Gregory;QUINN William E.;KING Matthew;HARTFORD, JR. Elliot H.;MOHAN Siddharth Harikrishna;SWEDLOVE Benjamin;KOTTAS Gregg |
| 分类号 |
H01L51/00;H01L51/56;C23C14/12;C23C14/24;C23C14/54 |
主分类号 |
H01L51/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A system comprising:
a nozzle; a source of material to be deposited on a substrate in fluid communication with the nozzle; a delivery gas source in fluid communication with the source of material to be deposited with the nozzle; an exhaust channel disposed adjacent to the nozzle; a confinement gas source in fluid communication with the nozzle and the exhaust channel, and disposed adjacent to the exhaust channel; and an actuator to adjust a fly height separation between a deposition nozzle aperture of the nozzle and a deposition target. |
| 地址 |
Ewing NJ US |
