| 摘要 |
Provided is an apparatus comprising a sample-support unit which retains a sample to be fixated in a plane wherein the plane defining first and second regions is separated by the plane within a space as the plane having an axial line. A source-mount unit in the first region is rotated around the axial line, and an X-ray source on the source-mount unit guides first and second incident beams of X-rays to be collided with the sample at respective first and second angles along each beam axial line perpendicular to the axial line. A detector-mount unit in the second region moves in the plane perpendicular to the axial line, and an X-ray detector on the detector-mount unit receives first and second diffracted beams of X-rays transmitted through the sample in response to the first and second incident beams and outputs first and second signals, respectively, in response to the received first and second diffracted beams. A processor analyzes the first and the second signals to determine a profile of a surface of the sample. |
