发明名称 |
PATTERNING OF OLED MATERIALS |
摘要 |
A method of making a patterned OLED layer or layers. The method uses a shadow mask having, for example, a free-standing silicon nitride membrane to pattern color emitter material with a feature size of less than 10 microns. The methods can be used, for example, in the manufacture of OLED microdisplays. |
申请公布号 |
US2015380652(A1) |
申请公布日期 |
2015.12.31 |
申请号 |
US201514849071 |
申请日期 |
2015.09.09 |
申请人 |
University of Rochester ;eMagin Corporation |
发明人 |
Chan Charles K.;Tang Ching W.;Vazan Fridrich;Ghosh Amal |
分类号 |
H01L51/00;H01L51/56;H01L27/32 |
主分类号 |
H01L51/00 |
代理机构 |
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代理人 |
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主权项 |
1. A method comprising:
providing a shadow mask having a free-standing silicon nitride membrane, silicon oxide membrane, or aluminum oxide membrane; forming a pattern of a first color emitter material on a substrate using the shadow mask, wherein the pattern of the first color emitter material has one or more first color emitter material structures; forming a pattern of a second color emitter material on the substrate having the pattern of the first color emitter material using a second shadow mask having a free-standing silicon nitride membrane, silicon oxide membrane, or aluminum oxide membrane, wherein the pattern of the second color emitter material has one or more second color emitter material structures; and forming a pattern of a third color emitter material on the substrate having the pattern of the first color emitter material and the pattern of the second color emitter material using a third shadow mask having a free-standing silicon nitride membrane, silicon oxide membrane, or aluminum oxide membrane, wherein the pattern of third color emitter material has one or more third color emitter material structures. |
地址 |
Rochester NY US |