发明名称 PATTERNING OF OLED MATERIALS
摘要 A method of making a patterned OLED layer or layers. The method uses a shadow mask having, for example, a free-standing silicon nitride membrane to pattern color emitter material with a feature size of less than 10 microns. The methods can be used, for example, in the manufacture of OLED microdisplays.
申请公布号 US2015380652(A1) 申请公布日期 2015.12.31
申请号 US201514849071 申请日期 2015.09.09
申请人 University of Rochester ;eMagin Corporation 发明人 Chan Charles K.;Tang Ching W.;Vazan Fridrich;Ghosh Amal
分类号 H01L51/00;H01L51/56;H01L27/32 主分类号 H01L51/00
代理机构 代理人
主权项 1. A method comprising: providing a shadow mask having a free-standing silicon nitride membrane, silicon oxide membrane, or aluminum oxide membrane; forming a pattern of a first color emitter material on a substrate using the shadow mask, wherein the pattern of the first color emitter material has one or more first color emitter material structures; forming a pattern of a second color emitter material on the substrate having the pattern of the first color emitter material using a second shadow mask having a free-standing silicon nitride membrane, silicon oxide membrane, or aluminum oxide membrane, wherein the pattern of the second color emitter material has one or more second color emitter material structures; and forming a pattern of a third color emitter material on the substrate having the pattern of the first color emitter material and the pattern of the second color emitter material using a third shadow mask having a free-standing silicon nitride membrane, silicon oxide membrane, or aluminum oxide membrane, wherein the pattern of third color emitter material has one or more third color emitter material structures.
地址 Rochester NY US