发明名称 |
CHEMICAL-MECHANICAL POLISHING COMPOSITIONS COMPRISING POLYETHYLENE IMINE |
摘要 |
Described is a chemical-mechanical polishing (CMP) composition comprising the following components: (A) surface modified silica particles having a negative zeta potential of −15 mV or below at a pH in the range of from 2 to 6 (B) one or more polyethylene imines (C) water (D) optionally one or more further constituents, wherein the pH of the composition is in the range of from 2 to 6. |
申请公布号 |
SG11201509209V(A) |
申请公布日期 |
2015.12.30 |
申请号 |
SG11201509209V |
申请日期 |
2014.05.05 |
申请人 |
BASF SE |
发明人 |
LAN, YONGQING;PRZYBYLSKI, PETER;BAO, ZHENYU;PRÖLSS, JULIAN |
分类号 |
C09G1/02;C09G1/00;C09G1/04;C09K3/14 |
主分类号 |
C09G1/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|