| 摘要 |
The present invention relates to a susceptor which is mounted inside a chamber and which supports and heats a wafer seated on the upper surface thereof, the susceptor for CVD processing according to the present invention comprising: a body having a plate-shape and being provided with a heater laying groove; a heater being sealed and fixed by being laid in the heater laying groove; and a shaft coupling to the center of the body so as to extend the drawing part of the heater, the drawing part being connected through the center of the body, wherein the heater preferably comprises therein a ceramic wire containing an Inconel hot wire, and an aluminum pipe covering the ceramic wire. According to the present invention, the heater further comprising therein the ceramic wire which primarily protects the Inconel hot wire, and the aluminum pipe which covers the ceramic wire may reduce the difference in thermal expansion with the material comprising the susceptor body. Thus, the durability of the susceptor can be increased, and further, the reliability of a semiconductor manufacturing device can be increased. |
