METHOD FOR FORMING A MONOCRYSTAL OF MATERIAL FROM A MONOCRYSTALLINE SUBSTRATE

摘要

The invention relates to a method for forming a monocrystal of material from a monocrystalline substrate having a surface with alternating recesses and elevations, comprising steps of: a) forming a layer of monocrystal by lateral epitaxial growth between the elevations; b) detecting defect areas in the layer of monocrystal by light etching of the layer of monocrystal; c) forming a mask on the layer of monocrystal between the detected defect areas; d) etching the layer of monocrystal provided with the mask, so as to form recesses in the defect areas of the layer and elevations outside the defect areas of the layer; and e) repeating step a).