| 摘要 |
The present invention has a step for preparing a substrate having an oxide film formed on the surface thereof, a step for preprocessing the surface of the oxide film, and a step for forming a carbon-containing nitride film on the surface of the preprocessed oxide film by: executing, for a predetermined number of times, a cycle that non-simultaneously carries out a step for supplying a raw material gas to the substrate, a step for supplying a carbon-containing gas to the substrate, and a step for supplying a nitrogen-containing gas to the substrate; executing, for a predetermined number of times, a cycle that non-simultaneously carries out a step for supplying a raw material gas to the substrate and a step for supplying a gas containing carbon and nitrogen to the substrate; or executing, for a predetermined number of times, a cycle that non-simultaneously carries out a step for supplying a carbon-containing raw material gas to the substrate and a step for supplying a nitrogen-containing gas to the substrate. |
