Apparatus and method for providing fluid for immersion lithography

摘要

Embodiments of the present invention are directed to a system and a method of controlling the flow and pressure of immersion fluid to provide stable conditions for immersion lithography. An immersion fluid is provided in a space (34) between a last optical element of an optical projection system and a workpiece during the immersion lithography process. For this purpose,a nozzle (20) is provided configured to supply immersion fluid in the gap between the last optical element and the workpiece, wherein the nozzle includes an inner cavity (34) to retain the immersion fluid in the gap and an outer cavity (53) to recover immersion fluid that exits the inner cavity.