发明名称 ZnO-Al2O3-MgO sputtering target and method for the production thereof
摘要 <p>It is known to produce a crystalline material consisting of ZnO-Al 2 O 3 -MgO(ZAMO) by dry mixing powders of raw material components comprising Al 2 O 3 , ZnO and MgO or precursors of these substances and sintering the powder mixtures so as to obtain the sputtering target. It is an object of the present invention to provide a target with high purity having 3N quality or better and which comprises no or small amounts of single phase consisting of Al 2 O 3 and MgO. For that purpose it is proposed that said the step of mixing comprises a mixing of powders of the raw material components in a liquid, said liquid provides low solubility for said raw material powders. The obtained ZAMO sputtering target is characterized by a microstructure containing single component oxide phase consisting of either Al 2 O 3 or of MgO in an amount of less than 1 % per weight.</p>
申请公布号 EP2767610(B1) 申请公布日期 2015.12.30
申请号 EP20130155587 申请日期 2013.02.18
申请人 HERAEUS DEUTSCHLAND GMBH & CO. KG 发明人 HERZOG, ANDREAS, DR.;SIMONS, CHRISTOPH, DR.
分类号 C23C14/34;C04B35/453;C04B35/626 主分类号 C23C14/34
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