发明名称 Implant encapsulation
摘要 An implant unit may include a substrate and an implantable circuit arranged on the substrate. An encapsulation structure may be disposed over at least a portion of the substrate and at least a portion of the implantable circuit, the encapsulation structure including a parylene layer and a silicon layer disposed over the parylene layer.
申请公布号 US9220907(B2) 申请公布日期 2015.12.29
申请号 US201414476715 申请日期 2014.09.03
申请人 发明人 Mashiach Adi;Maschiach Itzik
分类号 A61N1/05;A61N1/372;A61B17/04;A61N1/36;A61N1/378;H04B5/00;H02J7/02;A61N1/375 主分类号 A61N1/05
代理机构 Finnegan, Henderson, Farabow, Garrett & Dunner, LLP 代理人 Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
主权项 1. An implant unit, comprising: a substrate; an implantable circuit arranged on the substrate; and an encapsulation structure disposed over at least a portion of the substrate and at least a portion of the implantable circuit, the encapsulation structure including: a first polymer layer having a first density; a second polymer layer disposed over the first polymer layer and having a density which is less than the first density; and at least one pair of modulation electrodes connected to the implantable circuit, wherein the first polymer layer includes a first window of exposure over one or more of the modulation electrodes, the first window of exposure having a first area; and wherein the second polymer layer includes a second window of exposure over one or more of the modulation electrodes and at least partially extending over the first window of exposure, the second window of exposure having a second area that is larger than the first area of the first window of exposure.
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