发明名称 |
Implant encapsulation |
摘要 |
An implant unit may include a substrate and an implantable circuit arranged on the substrate. An encapsulation structure may be disposed over at least a portion of the substrate and at least a portion of the implantable circuit, the encapsulation structure including a parylene layer and a silicon layer disposed over the parylene layer. |
申请公布号 |
US9220907(B2) |
申请公布日期 |
2015.12.29 |
申请号 |
US201414476715 |
申请日期 |
2014.09.03 |
申请人 |
|
发明人 |
Mashiach Adi;Maschiach Itzik |
分类号 |
A61N1/05;A61N1/372;A61B17/04;A61N1/36;A61N1/378;H04B5/00;H02J7/02;A61N1/375 |
主分类号 |
A61N1/05 |
代理机构 |
Finnegan, Henderson, Farabow, Garrett & Dunner, LLP |
代理人 |
Finnegan, Henderson, Farabow, Garrett & Dunner, LLP |
主权项 |
1. An implant unit, comprising:
a substrate; an implantable circuit arranged on the substrate; and an encapsulation structure disposed over at least a portion of the substrate and at least a portion of the implantable circuit, the encapsulation structure including: a first polymer layer having a first density; a second polymer layer disposed over the first polymer layer and having a density which is less than the first density; and at least one pair of modulation electrodes connected to the implantable circuit, wherein the first polymer layer includes a first window of exposure over one or more of the modulation electrodes, the first window of exposure having a first area; and wherein the second polymer layer includes a second window of exposure over one or more of the modulation electrodes and at least partially extending over the first window of exposure, the second window of exposure having a second area that is larger than the first area of the first window of exposure. |
地址 |
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