| 摘要 |
A photosensitive resin composition includes (A) an alkali-soluble resin, (B) a polysiloxane, (C) an ethylenically unsaturated compound, (D) a photo-initiator, (E) a solvent, (F) a black pigment, and (G) a metal chelate. The alkali-soluble resin (A) includes an unsaturated-group-containing resin (A-1) obtained by subjecting a mixture containing (i) an epoxy compound having at least two epoxy groups and (ii) a compound having at least one carboxyl group and at least one ethylenically unsaturated group to polymerization. |
| 主权项 |
1. A photosensitive resin composition, comprising:
(A) an alkali-soluble resin including an unsaturated-group-containing resin (A-1) obtained by subjecting a mixture containing (i) an epoxy compound having at least two epoxy groups and (ii) a compound having at least one carboxyl group and at least one ethylenically unsaturated group to polymerization; (B) a polysiloxane; (C) an ethylenically unsaturated compound; (D) a photo-initiator; (E) a solvent; (F) a black pigment; and (G) a metal chelate; wherein said polysiloxane (B) is obtained by subjecting a silane monomer or a combination of said silane monomer and a siloxane prepolymer to hydrolysis and partial condensation, and said silane monomer is represented by formula (V):
SiR21m(OR22)4-m (V), wherein m is an integer ranging from 1 to 3, R21 independently represents a hydrogen, a substituted or unsubstituted C1-C10 alkyl group, a substituted or unsubstituted C2-C10 alkenyl group, or a substituted or unsubstituted C6-C15 aryl group, and wherein at least one of R21 is selected from the group consisting of 3-glutaric anhydride propyl, 3-butanedioic anhydride propyl, and 2-butanedioic anhydride ethyl, and R22 independently represents a hydrogen, a substituted or unsubstituted C1-C6 alkyl group, a substituted or unsubstituted C1-C6 acyl group, or a substituted or unsubstituted C6-C15 aryl group. |
