Substrate holding apparatus, exposure apparatus, and device fabricating method

摘要

To provide a substrate holding apparatus that can rapidly recover liquid that has infiltrated the rear surface side of a substrate. A substrate holding apparatus comprises: a base; a first support part, which is formed on the base and supports a rear surface of a substrate to be processed; a first circumferential wall part, which is formed on the base and is provided so that it opposes the rear surface of the substrate to be processed and surrounds the first support part; and a first recovery port, which is provided on the outer side of the first circumferential wall part; wherein, the flow of a gas along the first circumferential wall part moves the liquid on the outer side of the first circumferential wall part to the first recovery port, where the liquid is recovered.

主权项

1. A substrate holding apparatus that holds a substrate, to an upper surface of which a liquid is supplied, and that moves relative to a liquid immersion region formed by the liquid, the apparatus comprising:
a base; a first support part, which is formed on the base and supports a rear surface of the substrate; a first circumferential wall part, which is formed on the base and is provided so that the first circumferential wall part comprises an upper surface which opposes the rear surface of the substrate supported by the first support part and surrounds the first support part; a suction port that is (i) provided facing a first space defined by side surfaces comprising a portion of the base, a portion of the first circumferential wall part, and a portion of the substrate and (ii) capable of suctioning a gas in the first space, so that the first space is negatively pressurized; a second circumferential wall part, which is provided outside the first circumferential wall part; a side surface part which is provided along an outer side surface of the second circumferential wall part so that the side surface part surrounds the outer side surface of the second circumferential wall part; and a plurality of first recovery ports, which are provided facing a second space between an outer side surface of the first circumferential wall part and an inner side surface of the second circumferential wall part and recovers a liquid which infiltrates the second space,
wherein the plurality of first recovery ports are arranged along a circumferential direction of the first circumferential wall part and recovers the liquid inside the second space which is moved to the plurality of first recovery ports by a flow of the gas which is generated between the plurality of first recovery ports along the circumferential direction, and a vertical cross sectional shape of the first support part and a vertical cross sectional shape of the first circumferential wall part are different from each other.